科研论文
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[2] Luo,C(Luo,Chong)1;Xu,Y(Xu,Yi)1;Zeng,NY(Zeng,Nengyuan)1;Ma,TD(Ma,Tengda)1;Wang,CW(Wang,Chenwei)1;Liu,YL(Liu,Yuling)1. Synergy between dodecylbenzenesulfonic acid and isomeric alcohol polyoxyethylene ether for nano-scale scratch reduction in copper chemical mechanical polishing. TRIBOLOGY INTERNATIONAL, 2020, 152 , .
[3] 王聪1,2;，刘玉岭1,2;，王辰伟1,2;，张辉辉1,2;，曾能源1,2;，罗翀1,2;. 复合表面活性剂在铜CMP中减少缺陷的作用. 半导体技术, 2020, 45 5, 396-403.
[4] 王辰伟，刘玉岭，罗翀，王胜利，孙鸣，高宝红. 用于多层铜互连阻挡层CMP速率选择性的控制方法. , 2020, 河北工业大学，天津晶岭微电子材料有限公司, CN112355884A 2021.02.12.
[5] 刘玉岭，王辰伟，罗翀. GLSI多层布线高价金属在CMP中的应用. , 2020, 河北工业大学，天津晶岭微电子材料有限公司, CN111826089A 2020.10.27.
[6] 王辰伟，刘玉岭，罗翀，高宝红，何彦刚，张保国. 用于去除多层铜互连阻挡层CMP后表面残留物的清洗液. , 2020, 河北工业大学，天津晶岭微电子材料有限公司, CN112175756A 2021.01.05.
[7] 王辰伟，刘玉岭，罗翀，周建伟，牛新环，王如. 多层铜互连阻挡层抛光液及其制备方法. , 2020, 河北工业大学，天津晶岭微电子材料有限公司, CN112322190A 2021.02.05.
[8] Ma,TD(Ma,Tengda)1,2;Tan,BM(Tan,Baimei)1,2;Liu,YL(Liu,Yuling)1,2;Niu,XH(Niu,Xinhuan)1,2;Liu,GR(Liu,Guorui)1,2;Wang,CW(Wang,Chenwei)1,2;Luo,C(Luo,Chong)1,2;Xu,Y(Xu,Yi)1,2;Kao,ZX(Kao,Zhengxiao)1,2. Role of 1,2-benzisothiazolin-3-one (BIT) in the Improvement of Barrier CMP Performance with Alkaline Slurry. ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2019, 8 9, P449-P456.
[9] 罗翀，王辰伟，徐奕，宋国强，刘玉岭，檀柏梅. 用于降低多层铜互连阻挡层CMP缺陷的碱性抛光液及其制备方法. , 2019, 河北工业大学, CN111004579A 2020.04.14.